Industry application

Coriolis flow meters for microelectronics

Precision dosing in microelectronics manufacturing

Mass flow meters Mass-EXPERT for dosing chemical materials in the semiconductor industry — photoresists, solvents, CMP slurries, high-purity acids and ultrapure water (UPW). The absence of moving parts eliminates particle generation, ensuring impeccable process cleanliness.

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Photoresists CMP slurries High-purity acids UPW No particle generation Accuracy 0.1%
Typical media

Materials for microelectronics manufacturing

Mass-EXPERT Coriolis flow meters provide precision dosing of the liquids and gases used in semiconductor process operations — from photolithography to chemical-mechanical planarization and wafer cleaning.

High-purity acids

Sulfuric acid 96% (H₂SO₄), hydrochloric acid 37% (HCl), nitric acid (HNO₃), hydrofluoric acid (HF), orthophosphoric acid (H₃PO₄) — all in high-purity (SEMI) grade for wet etching and wafer cleaning processes.

H₂SO₄ 96% HCl 37% HF HNO₃

Photoresists

Positive and negative photoresists (i-line, KrF, ArF, EUV), anti-reflective coatings (BARC, TARC), developers and rinse solutions. Accurate dosing of volumes from microlitres up ensures uniform wafer coating.

i-line KrF ArF EUV BARC TARC

CMP slurries

Abrasive slurries based on colloidal silica (SiO₂), cerium oxide (CeO₂) and alumina (Al₂O₃) for chemical-mechanical planarization (CMP). Resistance to abrasive wear and high flow control accuracy.

SiO₂ CeO₂ Al₂O₃

UPW and solvents

Ultrapure water (UPW, 18.2 MΩ·cm), isopropanol (IPA), acetone, N-methylpyrrolidone (NMP), propylene glycol monomethyl ether (PGME), EBR solvents for photoresist stripping.

UPW IPA NMP PGME
Specialty gases

Gaseous media for semiconductor processes

In addition to liquids, Mass-EXPERT is used for dosing the specialty gases employed in CVD, PVD, etching and other process steps.

Inert and shielding gases

Nitrogen (N₂), argon (Ar) and helium (He) — for creating an inert atmosphere, purging lines, bubbling chemical solutions and pneumatic conveying.

N₂ Ar He

Process gases

Tetrafluoromethane (CF₄), nitrogen trifluoride (NF₃), tungsten hexafluoride (WF₆), monosilane (SiH₄), ammonia (NH₃), nitrous oxide (N₂O) and others used in CVD deposition and plasma etching.

CF₄ NF₃ SiH₄ NH₃ WF₆

Cryogenic and compressed gases

Liquefied gases (LN₂, LAr) at low temperatures, as well as high-pressure compressed gases for ion implantation and molecular beam epitaxy processes.

LN₂ LAr

Tube materials for semiconductor-grade purity

The choice of measuring tube material is critical for maintaining the high purity of process media and preventing wafer contamination.

Hastelloy (C4/C276)
High resistance to acids and halogens. Recommended for hot H₂SO₄, HCl and fluorine-containing media.
Tantalum
Maximum corrosion resistance to the most aggressive media. Suitable for HF, aqua regia and hot concentrated acids.
Stainless steel 316L
Base material for UPW, solvents and less aggressive media. The electropolished surface reduces the risk of contamination.
Advantages

Why Mass-EXPERT for semiconductors?

Coriolis direct mass measurement technology — the optimal solution for microelectronics manufacturing requirements

No particle generation

The design has no moving parts, seals, dead zones or rotating elements. Zero risk of process media contamination by wear particles.

Accuracy up to 0.1%

Precision dosing with accuracy of no more than 0.1% ensures repeatable application of photoresist, CMP slurries and acids in the processing of each wafer.

High-purity materials

Hastelloy and tantalum — materials that eliminate leaching of impurities on contact with process liquids.

Compact small DN sizes

DN01–DN08 sensors for ultra-low flow rates. Ideal for dosing expensive photoresists and photochemicals while minimising material losses.

Viscosity independence

Direct mass measurement is independent of changes in media viscosity and density. Stable accuracy when dosing CMP slurries whose viscosity varies with temperature.

In-place cleaning (CIP/SIP)

The smooth flow path with no dead zones ensures effective CIP/SIP cleaning. Minimal product changeover time and no cross-contamination.

Zero particle generation — a key advantage in microelectronics

In semiconductor manufacturing, even a single stray particle can cause a defective chip. Mass-EXPERT flow meters have no moving parts, rubbing seals or bearings — the only moving element is the medium itself, oscillating in the measuring tubes. This completely eliminates wear particle generation. The equipment is designed to meet the requirements of semiconductor cleanroom production.

Recommended configurations

Optimal solutions for the semiconductor industry

Proven combinations of sensors, materials and options for typical microelectronics manufacturing tasks

Small DN01–DN08 sensors

Compact sensors with minimal internal volume for precision dosing of microlitre volumes of expensive chemicals.

  • Micro-flows
  • Minimal dead volume — reduced reagent losses
  • Ideal for photoresists and photochemicals
  • Compact design for integration into equipment

Hastelloy / Tantalum

Corrosion-resistant materials ensuring maximum media purity and resistance to aggressive process liquids.

  • Hastelloy C4/C276 — for acids and halogen-containing media
  • Tantalum — for extremely aggressive media (HF, aqua regia)
  • Designed to cleanroom production requirements

ME100 or ME400 transmitter

Compact intelligent transmitters for embedding into semiconductor process equipment: ME100 — with a display and local controls, ME400 — ultra-compact, without a display, configured remotely.

  • ME100 — LCD display and control buttons: setup and viewing of data and events on site
  • ME100 — 4–20 mA output with HART; Ex db ib IIC T6 Gb design
  • ME400 — ultra-compact stainless steel body with a quick-release connector, 24 V power
  • ME400 — no display: fully controlled remotely via M-link software (no explosion protection)
  • Modbus RTU (RS-485) and pulse output — in both versions; automatic sensor diagnostics

0.1% accuracy for precision dosing

The highest accuracy class for critical dosing tasks where every drop of reagent affects die yield.

  • Base accuracy ±0.1% of the measured flow rate
  • Repeatability ±0.05%
  • Zero point stability from 0.008 kg/h
  • Turndown ratio up to 100:1

Recommendation for photoresist dosing

For precision dosing of photoresists onto wafers, choose the combination: DN01–DN04 sensor in Hastelloy C276 + ME100 transmitter with Modbus RTU — or the ultra-compact ME400 with remote control. This configuration provides 0.1% accuracy, zero media contamination and minimal dead volume — saving expensive photochemicals at every product change.

Key parameters

Mass-EXPERT technical capabilities for electronics

Liquid mass flow rate: from 1.2 to 39,000 kg/h (DN01–DN50)
Measurement accuracy: ±0.1% – ±0.2%
Density measurement range: 650–2000 kg/m³
Medium temperature: from –196 to +350 °C
Working pressure: up to 96 MPa
Output signals: 4–20 mA HART, RS-485 Modbus
Ingress protection: IP66/IP67
FAQ

Frequently asked questions

Answers to the questions most often asked about this application.

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690 questions across 23 applications — in the FAQ Center

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